Application of Uracil for the Preparation of low-index nanostructured Layers
Posted on 2018-07-12 - 15:12
Nanostructured layers generated by plasma etching immediately after the evaporation process can exhibit an effective refractive index down to approximately 1.15. Uracil, a nucleobase derived from pyrimidine chemical structure, has been identified to form suitable bump structures in a self-organized way. It is assumed that the molecule’s ability to form aggregates plays an essential role in initiating the structure formation. A nanostructured uracil layer has been used as the final layer of an antireflection coating to demonstrate broadband and wide-angle antireflection performance.
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Schulz, Ulrike; Knopf, Heiko; Munzert, Peter; Rickelt, Friedrich; Seifert, Tina (2018). Application of Uracil for the Preparation of low-index nanostructured Layers. Optica Publishing Group. Collection. https://doi.org/10.6084/m9.figshare.c.4109180.v1
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AUTHORS (5)
US
Ulrike Schulz
HK
Heiko Knopf
PM
Peter Munzert
FR
Friedrich Rickelt
TS
Tina Seifert