One-step formation of a plasmonic grating with an ultranarrow resonance linewidth for sensing

Posted on 23.06.2022 - 16:47
Nanograting-based plasmonic sensors are capable of real-time and label-free detection for biomedical applications. Simple and low-cost manufacturing methods of high quality sensors are always demanding. In this study, we report on a one-step etch-free method by directly patterning photoresist on copper substrate using laser interference lithography. Large area uniform grating with a period of 600 nm were fabricated on the copper film and its refractive index sensing performance is tested using glucose as analyte. Attributed to the photoresist grating ridge, more electromagnetic filed is bonded at the metal-dielectric interface than the case of metallic grating ridge. As a result, much sharper resonance linewidth (~ 10 nm) and improved sensing ability compared to the traditional copper gratings are demonstrated. This design scheme circumvents the complexity of the conventional multi-step plasmonic sensor fabrication process and shows great potential for cost-effective mass production of nanograting-based plasmonic sensors with relatively enhanced sensing performance.

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He, Zhigang; Kang, Guoguo; Wang, Junyi; Ding, Ning; Chai, Yuwei (2022): One-step formation of a plasmonic grating with an ultranarrow resonance linewidth for sensing. Optica Publishing Group. Collection. https://doi.org/10.6084/m9.figshare.c.6037076.v2
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AUTHORS (5)

Zhigang He
Guoguo Kang
Junyi Wang
Ning Ding
Yuwei Chai

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