Ultrathin, reflective light-field imaging film realized by self-releasing UV-curable nanoimprinting lithography

Light-field imaging has emerged as a technology allowing to capture richer visual information from the world. Ultrathin, reflective light-field imaging film is fabricated by using self-releasing UV-curable nanoimprinting lithography. The plenoptic function is built to generate the dense reflective light field in a two-dimension plane in which the occlusion perception can be seamlessly incorporated in the recording process. A self-releasing nanoimprinting technique is developed to realize the imaging film with a thickness of 25 μm and full field of view. The results pave the way towards developing high-performance light-field imaging device that can be used as visual security feature, or in virtual/augmented reality and computer vision application etc.